SiC CVD
- CVD Furnace System (customized)
- 1~9 poles (up to 30 rings each)
- Pumping/cooling utility
- MTS supply and tanks utility
- Modeling, Process Engineering & Logistics
- Software for a Full Automated System Control
Special valves
- HEATING Vacuum Valve (V/V)
- COOLING V/V (Can work in a temperature over 300 degrees)
- Vacuum valve with non-exposed O-ring
- Chamber Roughing V/V
- Chamber Gate V/V
- Protection Gate V/V
- Auto Gate V/V
- Angle V/V for remote plasma systems
- Gate V/V for remote plasma systems
Equipment
- For Vacuum and Plasma Technology in Semiconductor Manufacturing
- Plasma Source Chamber (ICP, CCP, PE, RIE)
- Transfer Chamber, Load Lock Chamber
- Vacuum Process Equipment for Universities and Research Institutes
- Etch/CVD Equipment
- CVD Furnace Equipment
- LCD, OLED Equipment
SOFTWARE DEVELOPMENT
- Automated Control system for Semiconductor Process
- Equipment (Chamber) control by transmitting/receving IO signals through Fieldbus
- System structure displayed with GUI
- Communication control between PLC (Mitsubishi)
- Code languages: C, C++, Windows API
- Operating System : MS Windows 10-11
PARTS MACHINING
- Ultra-precision manufacturing of Semiconductor components
- Aluminum, steel and non-metallic manufacturing
- Independent design and assembly inspection
- Modelling in SOLIDWORKS, connected with SolidCAM
LET’S MEET EACH OTHER
REQUEST A QUOTE
You’re always welcome to ask us any questions. Submit your message here, and we will contact you soon.
Call or visit us : 09:00 ~ 18:00 (except Sat, Sun and public holidays)
TEL: 82-31-8077-2500 laontmd@laontmd.com 150-ho, 425, Doksanseong-ro, Osan-si, Gyeonggi-do, Republic of Korea, 18105